we report the growth of BaTiO3 thin films by standard Radio Frequency
sputtering. Without any in situ or post annealing, these polycristalline films
are oriented relative to the substrate even when it is amorphous. We show that this
preferential orientation may be monitored using a DC Bias during the film growth. At
room temperature, cubic films of (100) and (110) orientations have been achieved, on
fused silica substrate. Some optical waveguiding properties of these films have been
studied. The resulting film index is 2.26 and the optical step index at the substrate
interface is sharp. This allows the use of standard RF sputtering techniques to
monitor oriented BaTiO3 films for linear optical applications.